Aether and the Dry Lithography Revolution

Chasing ever-smaller chips requires new approaches beyond wet resists. In this episode, we dive into LAM Research's Aether—an all-dry resist process that uses vapor deposition and EUV lithography to pattern features at nanometer scales, delivering higher yields, lower material usage, and energy savings. We're joined by real-world adopters like memory manufacturers and IBM, plus insights from EMEK’s qualification at the 2-nm node. We'll unpack the science, the business, and what this could mean for Moore's Law—and for the future of sustainable semiconductor manufacturing.

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